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V2O5 Vapor deposition materials, thin film electronic materials, Universities and research institutes develop materials

V2O5 Vapor deposition materials, thin film electronic materials, Universities and research institutes develop materials

Vanadium oxide materials available for use in the RF sputtering process essential for the manufacturing of microelectronics components!

■ Purity > 99.9% ■ Density (4.26 g/cm³) ■ HP Process *For more details, please download the PDF or feel free to contact us.*

  • Composite Materials
  • Other metal materials

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